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E C E

College of Engineering · University of Wisconsin-Madison
76,389 grades146 courses253 professors38 terms

Department and course prefixes as University of Wisconsin-Madison lists them in its own catalog.

3.47
average GPA across 76,389 grades
+1% vs. University of Wisconsin-Madison overall (3.42)
90%
A or B
of 76,389 grades
2.0%
D, F or withdrew
A60.6%
B29.4%
Every term against the 3.47 department average 38 terms
Fall 2006Fall 2025
Most taken
E C E 376
ELECTRICAL AND ELECTRONIC CIRCUITS
3.13
4,259 grades
−10% vs. dept
E C E 230
CIRCUIT ANALYSIS
3.06
3,990 grades
−12% vs. dept
E C E 210
INTRODUCTORY EXPERIENCE IN ELECTRICAL ENGINEERING
3.97
3,880 grades
+14% vs. dept
E C E 203
SIGNALS, INFORMATION, AND COMPUTATION
3.35
3,338 grades
−4% vs. dept
E C E 270
CIRCUITS LABORATORY I
3.66
3,233 grades
+6% vs. dept
E C E 340
ELECTRONIC CIRCUITS I
3.18
3,143 grades
−8% vs. dept
E C E 220
ELECTRODYNAMICS I
3.18
2,681 grades
−8% vs. dept
E C E 330
SIGNALS AND SYSTEMS
3.19
2,529 grades
−8% vs. dept
Courses with a grade record · 146
100 level1200 level10300 level27400 level26500 level25600 level7700 level32800 level10900 level8
CourseDistributionGPAvs. deptGrades
100 level1 course
E C E 170
3.81 +10% vs. dept 823
200 level10 courses
E C E 203 · — SIGNALS, INFORMATION, AND COMPUTATION
3.35 −4% vs. dept 3,338
E C E 204 · — DATA SCIENCE & ENGINEERING
3.70 +7% vs. dept 642
E C E 210 · — INTRODUCTORY EXPERIENCE IN ELECTRICAL ENGINEERING
3.97 +14% vs. dept 3,880
E C E 219 · — ANALYTICAL METHODS FOR ELECTROMAGNETICS ENGINEERING
3.81 +10% vs. dept 2,304
E C E 220 · — ELECTRODYNAMICS I
3.18 −8% vs. dept 2,681
E C E 222 · — ELECTRODYNAMICS I
3.16 −9% vs. dept 393
E C E 230 · — CIRCUIT ANALYSIS
3.06 −12% vs. dept 3,990
E C E 235 · — INTRODUCTION TO SOLID STATE ELECTRONICS
3.26 −6% vs. dept 1,736
E C E 270 · — CIRCUITS LABORATORY I
3.66 +6% vs. dept 3,233
E C E 271 · — CIRCUITS LABORATORY II
3.54 +2% vs. dept 1,830
300 level27 courses
E C E 301
3.73 +7% vs. dept 20
E C E 303 · — INTRODUCTION TO REAL-TIME DIGITAL SIGNAL PROCESSING
3.78 +9% vs. dept 566
E C E 304 · — ELECTRIC MACHINES LABORATORY
3.55 +2% vs. dept 274
E C E 305 · — SEMICONDUCTOR PROPERTIES LABORATORY
3.84 +11% vs. dept 297
E C E 306
3.82 +10% vs. dept 184
E C E 308
3.85 +11% vs. dept 104
E C E 313 · — OPTOELECTRONICS LAB
3.90 +12% vs. dept 778
E C E 315 · — INTRODUCTORY MICROPROCESSOR LABORATORY
3.89 +12% vs. dept 1,767
E C E 317 · — SENSORS LABORATORY
3.89 +12% vs. dept 737
E C E 320 · — ELECTRODYNAMICS II
3.39 −2% vs. dept 900
E C E 321
3.39 −2% vs. dept 281
E C E 330 · — SIGNALS AND SYSTEMS
3.19 −8% vs. dept 2,529
E C E 331 · — INTRODUCTION TO RANDOM SIGNAL ANALYSIS AND STATISTICS
3.03 −13% vs. dept 840
E C E 332 · — FEEDBACK CONTROL SYSTEMS
3.12 −10% vs. dept 720
E C E 334 · — STATE SPACE SYSTEMS ANALYSIS
3.27 −6% vs. dept 211
E C E 335 · — MICROELECTRONIC DEVICES
3.17 −9% vs. dept 856
E C E 340 · — ELECTRONIC CIRCUITS I
3.18 −8% vs. dept 3,143
E C E 342 · — ELECTRONIC CIRCUITS II
3.37 −3% vs. dept 2,057
E C E 351
3.57 +3% vs. dept 91
E C E 353 · — INTRODUCTION TO MICROPROCESSOR SYSTEMS
3.22 −7% vs. dept 2,165
E C E 355 · — ELECTROMECHANICAL ENERGY CONVERSION
3.32 −4% vs. dept 662
E C E 356 · — ELECTRIC POWER PROCESSING FOR ALTERNATIVE ENERGY SYSTEMS
3.24 −7% vs. dept 472
E C E 370 · — ADVANCED LABORATORY
3.87 +12% vs. dept 1,652
E C E 376 · — ELECTRICAL AND ELECTRONIC CIRCUITS
3.13 −10% vs. dept 4,259
E C E 377 · — FUNDAMENTALS OF ELECTRICAL AND ELECTRO-MECHANICAL POWER CONVERSION
3.27 −6% vs. dept 2,331
E C E 379 · — SPECIAL TOPICS IN ELECTRICAL AND COMPUTER ENGINEERING
3.76 +9% vs. dept 295
E C E 399 · — INDEPENDENT STUDY
3.91 +13% vs. dept 185
400 level26 courses
E C E 401 · — ELECTRO-ACOUSTICAL ENGINEERING
3.61 +4% vs. dept 494
E C E 409
3.53 +2% vs. dept 84
E C E 411 · — INTRODUCTION TO ELECTRIC DRIVE SYSTEMS
3.23 −7% vs. dept 924
E C E 412 · — POWER ELECTRONIC CIRCUITS
3.47 −0% vs. dept 1,056
E C E 415
4.00 +15% vs. dept 14
E C E 417
3.39 −2% vs. dept 19
E C E 420 · — ELECTROMAGNETIC WAVE TRANSMISSION
3.21 −7% vs. dept 386
E C E 427 · — ELECTRIC POWER SYSTEMS
3.50 +1% vs. dept 959
E C E 431 · — DIGITAL SIGNAL PROCESSING
3.43 −1% vs. dept 627
E C E 432 · — DIGITAL SIGNAL PROCESSING LABORATORY
3.56 +3% vs. dept 125
E C E 434 · — PHOTONICS
3.37 −3% vs. dept 237
E C E 436 · — COMMUNICATION SYSTEMS I
3.36 −3% vs. dept 306
E C E 437 · — COMMUNICATION SYSTEMS II
3.56 +3% vs. dept 152
E C E 438
3.75 +8% vs. dept 8
E C E 439 · — INTRODUCTION TO ROBOTICS
3.53 +2% vs. dept 825
E C E 440
3.46 −0% vs. dept 71
E C E 444
2.83 −18% vs. dept 9
E C E 445 · — SEMICONDUCTOR PHYSICS AND DEVICES
3.74 +8% vs. dept 197
E C E 447 · — APPLIED COMMUNICATIONS SYSTEMS
3.53 +2% vs. dept 141
E C E 453 · — EMBEDDED MICROPROCESSOR SYSTEM DESIGN
3.78 +9% vs. dept 694
E C E 454 · — MOBILE COMPUTING LABORATORY
3.85 +11% vs. dept 362
E C E 455 · — CAPSTONE DESIGN IN ELECTRICAL AND COMPUTER ENGINEERING
3.85 +11% vs. dept 68
E C E 466 · — ELECTRONICS OF SOLIDS
3.61 +4% vs. dept 27
E C E 468
3.75 +8% vs. dept 65
E C E 489 · — HONORS IN RESEARCH
4.00 +15% vs. dept 1
E C E 491 · — SENIOR DESIGN PROJECT
3.82 +10% vs. dept 14
500 level25 courses
E C E 504 · — ELECTRIC MACHINE & DRIVE SYSTEM LABORATORY
3.71 +7% vs. dept 68
E C E 511 · — THEORY AND CONTROL OF SYNCHRONOUS MACHINES
3.54 +2% vs. dept 73
E C E 512 · — POWER ELECTRONICS LABORATORY
3.85 +11% vs. dept 184
E C E 525 · — INTRODUCTION TO PLASMAS
3.40 −2% vs. dept 594
E C E 527 · — PLASMA CONFINEMENT AND HEATING
3.61 +4% vs. dept 180
E C E 528 · — PLASMA PROCESSING AND TECHNOLOGY
3.62 +4% vs. dept 127
E C E 535 · — INTRODUCTION TO QUANTUM SENSING
3.83 +11% vs. dept 24
E C E 536 · — INTEGRATED OPTICS AND OPTOELECTRONICS
3.62 +4% vs. dept 105
E C E 537 · — COMMUNICATION NETWORKS
3.51 +1% vs. dept 326
E C E 541 · — ANALOG MOS INTEGRATED CIRCUIT DESIGN
3.41 −2% vs. dept 98
E C E 542 · — INTRODUCTION TO MICROELECTROMECHANICAL SYSTEMS
3.73 +8% vs. dept 120
E C E 543
2.91 −16% vs. dept 11
E C E 545 · — ADVANCED MICROWAVE MEASUREMENTS FOR COMMUNICATIONS
3.95 +14% vs. dept 11
E C E 546
3.75 +8% vs. dept 46
E C E 547 · — ADVANCED COMMUNICATIONS CIRCUIT DESIGN
3.76 +8% vs. dept 52
E C E 548 · — INTEGRATED CIRCUIT DESIGN
3.36 −3% vs. dept 334
E C E 549 · — INTEGRATED CIRCUIT FABRICATION LABORATORY
3.47 −0% vs. dept 130
E C E 551 · — DIGITAL SYSTEM DESIGN AND SYNTHESIS
3.29 −5% vs. dept 2,401
E C E 553 · — TESTING AND TESTABLE DESIGN OF DIGITAL SYSTEMS
3.42 −1% vs. dept 267
E C E 554 · — DIGITAL ENGINEERING LABORATORY
3.77 +9% vs. dept 486
E C E 555 · — DIGITAL CIRCUITS AND COMPONENTS
3.38 −2% vs. dept 940
E C E 556 · — DESIGN AUTOMATION OF DIGITAL SYSTEMS
3.45 −0% vs. dept 378
E C E 570 · — ETHICS OF DATA FOR ENGINEERS
3.91 +13% vs. dept 17
E C E 576 · — PRINTED AND FLEXIBLE ELECTRONICS: MANUFACTURING, DEVICES, AND APPLICATIONS
3.81 +10% vs. dept 24
E C E 577 · — AUTOMATIC CONTROLS LABORATORY
3.76 +8% vs. dept 112
600 level7 courses
E C E 601 · — SPECIAL TOPICS IN ELECTRICAL AND COMPUTER ENGINEERING
3.80 +9% vs. dept 370
E C E 602
3.85 +11% vs. dept 41
E C E 610 · — SEMINAR IN ELECTRICAL AND COMPUTER ENGINEERING
3.88 +12% vs. dept 755
E C E 611 · — INTRODUCTION TO DOCTORAL RESEARCH IN ELECTRICAL & COMPUTER ENGINEERING
3.97 +15% vs. dept 268
E C E 630
3.83 +11% vs. dept 87
E C E 641
3.41 −2% vs. dept 28
E C E 699 · — ADVANCED INDEPENDENT STUDY
3.89 +12% vs. dept 84
700 level32 courses
E C E 711 · — DYNAMICS AND CONTROL OF AC DRIVES
3.49 +1% vs. dept 423
E C E 712 · — SOLID STATE POWER CONVERSION
3.82 +10% vs. dept 480
E C E 713 · — ELECTROMAGNETIC DESIGN OF AC MACHINES
3.59 +3% vs. dept 198
E C E 714 · — UTILITY APPLICATION OF POWER ELECTRONICS
3.87 +12% vs. dept 147
E C E 717 · — LINEAR SYSTEMS
3.56 +3% vs. dept 326
E C E 719
3.36 −3% vs. dept 66
E C E 723 · — ON-LINE CONTROL OF POWER SYSTEMS
3.94 +14% vs. dept 78
E C E 724 · — WAVES AND INSTABILITIES IN PLASMAS
3.65 +5% vs. dept 174
E C E 725 · — PLASMA KINETIC THEORY AND RADIATION PROCESSES
3.50 +1% vs. dept 203
E C E 726 · — PLASMA MAGNETOHYDRODYNAMICS
3.54 +2% vs. dept 156
E C E 729 · — INFORMATION THEORY
3.44 −1% vs. dept 149
E C E 730 · — PROBABILITY AND RANDOM PROCESSES
3.51 +1% vs. dept 332
E C E 731 · — ADVANCED POWER SYSTEM ANALYSIS
3.92 +13% vs. dept 59
E C E 732 · — DYNAMICS OF CONTROLLED SYSTEMS
3.45 −0% vs. dept 43
E C E 733 · — ADVANCED COMPUTER CONTROL OF MACHINES AND PROCESSES
3.50 +1% vs. dept 12
E C E 734 · — VLSI ARRAY STRUCTURES FOR DIGITAL SIGNAL PROCESSING
3.64 +5% vs. dept 47
E C E 735 · — SIGNAL SYNTHESIS AND RECOVERY TECHNIQUES
3.34 −4% vs. dept 119
E C E 736 · — WIRELESS COMMUNICATIONS
3.61 +4% vs. dept 42
E C E 738 · — ADVANCED DIGITAL IMAGE PROCESSING
3.90 +12% vs. dept 176
E C E 739
3.87 +12% vs. dept 107
E C E 740 · — ELECTROMAGNETIC THEORY
3.60 +4% vs. dept 293
E C E 741 · — SEMICONDUCTOR DIODE LASERS AND OTHER OPTOELECTRONIC DEVICES
3.81 +10% vs. dept 123
E C E 742 · — COMPUTATIONAL METHODS IN ELECTROMAGNETICS
3.86 +11% vs. dept 193
E C E 743 · — HIGH-POWER DIODE LASERS AND AMPLIFIERS
3.76 +8% vs. dept 92
E C E 744 · — THEORY OF MICROWAVE CIRCUITS AND DEVICES
3.70 +7% vs. dept 89
E C E 745 · — SOLID STATE ELECTRONICS
3.67 +6% vs. dept 248
E C E 746 · — QUANTUM ELECTRONICS
3.74 +8% vs. dept 72
E C E 747 · — NANOPHOTONICS
3.68 +6% vs. dept 76
E C E 748 · — LINEAR WAVES
3.91 +13% vs. dept 153
E C E 749 · — COHERENT GENERATION AND PARTICLE BEAMS
3.67 +6% vs. dept 6
E C E 751 · — EMBEDDED COMPUTING SYSTEMS
3.67 +6% vs. dept 209
E C E 753 · — FAULT-TOLERANT COMPUTING
3.62 +5% vs. dept 104
800 level10 courses
E C E 817 · — NONLINEAR SYSTEMS
3.88 +12% vs. dept 34
E C E 821 · — OPTIMAL CONTROL AND VARIATIONAL METHODS
3.60 +4% vs. dept 34
E C E 826 · — THEORETICAL FOUNDATIONS OF LARGE-SCALE MACHINE LEARNING
3.66 +5% vs. dept 32
E C E 830
3.46 −0% vs. dept 181
E C E 835 · — LIGHT INTERACTIONS WITH QUANTUM MATERIALS
3.71 +7% vs. dept 19
E C E 841 · — ANTENNAS
3.63 +5% vs. dept 70
E C E 842 · — TOPICS IN APPLIED ALGEBRA
3.88 +12% vs. dept 68
E C E 845 · — TRANSPORT IN SEMICONDUCTOR DEVICES
3.69 +6% vs. dept 73
E C E 848
3.97 +14% vs. dept 84
E C E 888 · — TOPICS IN MATHEMATICAL DATA SCIENCE
3.91 +13% vs. dept 162
900 level8 courses
E C E 901 · — SPECIAL TOPICS IN ELECTRICAL AND COMPUTER ENGINEERING
3.86 +11% vs. dept 401
E C E 902
3.60 +4% vs. dept 43
E C E 903
3.50 +1% vs. dept 12
E C E 904
3.87 +11% vs. dept 93
E C E 905
3.93 +13% vs. dept 61
E C E 908
4.00 +15% vs. dept 16
E C E 922 · — SEMINAR IN PLASMA PHYSICS
3.98 +15% vs. dept 125
E C E 999 · — ADVANCED INDEPENDENT STUDY
3.96 +14% vs. dept 54
36 more E C E courses appear in the catalog with no grade record yet.
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